Invention Grant
US07716813B2 Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask
有权
使用电子束抗蚀剂掩模制造用于磁头的磁写磁极的方法
- Patent Title: Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask
- Patent Title (中): 使用电子束抗蚀剂掩模制造用于磁头的磁写磁极的方法
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Application No.: US11634667Application Date: 2006-12-05
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Publication No.: US07716813B2Publication Date: 2010-05-18
- Inventor: Kim Y. Lee , Jyh-Shuey Lo
- Applicant: Kim Y. Lee , Jyh-Shuey Lo
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/187
- IPC: G11B5/187 ; B44C1/22

Abstract:
A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.
Public/Granted literature
- US20080127481A1 Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask Public/Granted day:2008-06-05
Information query
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