Invention Grant
- Patent Title: Gas flow rate verification unit
- Patent Title (中): 气体流量验证单元
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Application No.: US12223808Application Date: 2007-02-22
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Publication No.: US07716993B2Publication Date: 2010-05-18
- Inventor: Yukio Ozawa , Minoru Ito , Hiroki Doi , Akiko Nakada
- Applicant: Yukio Ozawa , Minoru Ito , Hiroki Doi , Akiko Nakada
- Applicant Address: JP Komaki-Shi
- Assignee: CKD Corporation
- Current Assignee: CKD Corporation
- Current Assignee Address: JP Komaki-Shi
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-061118 20060307
- International Application: PCT/JP2007/053271 WO 20070222
- International Announcement: WO2007/102319 WO 20070913
- Main IPC: G01F1/00
- IPC: G01F1/00 ; G01F25/00 ; G01F1/34

Abstract:
A gas flow rate verification unit capable of enhancing reliability of gas flow rate verification. The gas flow rate verification unit has a first cutoff valve that is connected to a flow rate control device and to which gas is inputted, a second cutoff valve for discharging the gas, a communication member for allowing the first cutoff valve and the second cutoff valve to communicate with each other, a pressure sensor for detecting the pressure of the gas supplied between the first cutoff valve and the second cutoff valve, a temperature detector for detecting the temperature of the gas supplied between the first cutoff valve and the second cutoff valve, and a control means for verifying the flow of the gas flowing in the flow control device, the verification being performed by using both the result of the pressure detected by the pressure sensor and the result of the temperatures detected by the temperature detector. The volume (Vk) between the valve seat of the first cutoff valve and the valve seat of the second cutoff valve is equal to or less than the volume (Ve) between the outlet of the flow control device and the valve seat of the first cutoff valve.
Public/Granted literature
- US20090019943A1 Gas Flow Rate Verification Unit Public/Granted day:2009-01-22
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