Invention Grant
- Patent Title: Crystal manufacturing apparatus
- Patent Title (中): 水晶制造装置
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Application No.: US12042964Application Date: 2008-03-05
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Publication No.: US07718002B2Publication Date: 2010-05-18
- Inventor: Seiji Sarayama , Hirokazu Iwata
- Applicant: Seiji Sarayama , Hirokazu Iwata
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Dickstein Shapiro LLP
- Priority: JP2007-056859 20070307; JP2007-320289 20071212
- Main IPC: C30B13/14
- IPC: C30B13/14

Abstract:
A crystal manufacturing apparatus for manufacturing a group III nitride crystal includes a crucible that holds a mixed molten liquid including an alkali metal and a group III metal; a reaction vessel accommodating the crucible in the reaction vessel; a heating device that heats the crucible with the reaction vessel; a holding vessel having a lid that is capable of opening and closing, accommodating the reaction vessel and the heating device in the holding vessel; a sealed vessel accommodating the holding vessel in the sealed vessel, having an operating device that enables opening the lid of the holding vessel for supplying source materials into the crucible and taking out a manufactured GaN crystal under a sealed condition, and closing the lid of the holding vessel that is sealed in the sealed vessel, the sealed vessel including an inert gas atmosphere or a nitrogen atmosphere; and a gas supplying device for supplying a nitrogen gas to the mixed molten liquid through each of the vessels.
Public/Granted literature
- US20080216737A1 CRYSTAL MANUFACTURING APPARATUS Public/Granted day:2008-09-11
Information query
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