Invention Grant
- Patent Title: Film forming equipment and film forming method
- Patent Title (中): 成膜设备及成膜方法
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Application No.: US11661126Application Date: 2005-08-25
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Publication No.: US07718005B2Publication Date: 2010-05-18
- Inventor: Tatsuya Handa , Yasushi Aiba
- Applicant: Tatsuya Handa , Yasushi Aiba
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-245835 20040825
- International Application: PCT/JP2005/015436 WO 20050825
- International Announcement: WO2006/022328 WO 20060302
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/52

Abstract:
Film forming equipment (20) is provided with a treatment container (22), a gas supplying system for supplying the container with a treatment gas including a film forming gas, and an exhaust system for exhausting the atmosphere in the container. In the treatment container, a placing table (46) having a placing plane for placing a flat board shaped body to be treated (W) is arranged. The body to be treated on the placing table is heated by a heater (80). A clamping apparatus (56) is provided to abut/separate to and from a surface peripheral part of the body to be treated, so as to press/release the body to be treated on and from the placing table. On the placing plane of the placing table, a suction structure (92) having a recessed part (94) is formed for temporarily sucking the body to be treated by pressure difference, by forming a substantially hermetic space between the placing plane and the rear plane of the body to be treated.
Public/Granted literature
- US20070254101A1 Film Forming Equipment and Film Forming Method Public/Granted day:2007-11-01
Information query
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