Invention Grant
- Patent Title: Process for producing electroluminescent element
- Patent Title (中): 电致发光元件的制造方法
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Application No.: US11787911Application Date: 2007-04-18
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Publication No.: US07718352B2Publication Date: 2010-05-18
- Inventor: Tomoyuki Tachikawa , Norihito Itoh , Keisuke Hashimoto
- Applicant: Tomoyuki Tachikawa , Norihito Itoh , Keisuke Hashimoto
- Applicant Address: JP Tokyo
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Harness, Dickey & Pierce, PLC
- Priority: JP2006-115217 20060419
- Main IPC: G03C5/00
- IPC: G03C5/00

Abstract:
There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts from which the photoresist has been removed.
Public/Granted literature
- US20070287106A1 Process for producing electroluminescent element Public/Granted day:2007-12-13
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