Invention Grant
- Patent Title: Method for manufacturing a semiconductor laser
- Patent Title (中): 半导体激光器的制造方法
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Application No.: US12029510Application Date: 2008-02-12
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Publication No.: US07718454B2Publication Date: 2010-05-18
- Inventor: Hitoshi Nakamura , Shinji Abe , Harumi Nishiguchi
- Applicant: Hitoshi Nakamura , Shinji Abe , Harumi Nishiguchi
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2007-035342 20070215; JP2008-002879 20080110
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of manufacturing semiconductor laser device including a GaN wafer includes forming a semiconductor layer on the GaN wafer and on which ridge portions are formed. Grooves are formed in the semiconductor layer such that each groove is disposed in line with the scribe marks, between each of the ridge portions and an upstream scribe mark. The grooves are curved and convex outwardly towards a downstream side, and each groove has an apex on a cleavage line. The side extending from the apex preferably does not form an angle of 60 degrees with respect to a cleavage direction or the cleavage line.
Public/Granted literature
- US20080199983A1 METHOD FOR MANUFACTURING A SEMICONDUCTOR LASER Public/Granted day:2008-08-21
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