Invention Grant
US07718461B2 Nanometer-scale electromechanical switch and fabrication process 有权
纳米级机电开关及制造工艺

Nanometer-scale electromechanical switch and fabrication process
Abstract:
The present invention describes nano-scale fabrication technique used to create a sub-micron wide gap across the center conductor of a coplanar waveguide transmission line configured in a fixed-fixed beam arrangement, resulting in a pair of opposing cantilever beams that comprise an electro-mechanical switch. Accordingly, a nanometer-scale mechanical switch with very high switching speed and low actuation voltage has been developed. This switch is intended primarily for application in the RF/microwave/wireless industry.
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