Invention Grant
- Patent Title: Nitride semiconductor device
- Patent Title (中): 氮化物半导体器件
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Application No.: US11525012Application Date: 2006-09-22
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Publication No.: US07718992B2Publication Date: 2010-05-18
- Inventor: Jong Hak Won , Soo Han Kim , Jae Woong Han , Seong Suk Lee
- Applicant: Jong Hak Won , Soo Han Kim , Jae Woong Han , Seong Suk Lee
- Applicant Address: KR Kyungki-Do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Kyungki-Do
- Agency: McDermott Will & Emery LLLP
- Priority: KR10-2005-0088772 20050923
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
A nitride semiconductor device is provided. In the device, first and second conductivity type nitride layers are formed. An active layer is formed between the first and second conductivity type nitride layers. The active layer includes at least one quantum barrier layer and at least one quantum well layer. Also, a current spreading layer is interposed between the first conductivity type nitride layer and the active layer. The current spreading layer has an In content greater than the quantum well layer of the active layer.
Public/Granted literature
- US20070069234A1 Nitride semiconductor device Public/Granted day:2007-03-29
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