Invention Grant
- Patent Title: Electronic device and its manufacturing method
- Patent Title (中): 电子器件及其制造方法
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Application No.: US10535927Application Date: 2003-11-05
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Publication No.: US07719032B2Publication Date: 2010-05-18
- Inventor: Ryuichiro Maruyama , Masafumi Ata , Masashi Shiraishi
- Applicant: Ryuichiro Maruyama , Masafumi Ata , Masashi Shiraishi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wolf, Greenfield & Sacks, P.C.
- Priority: JP2002-335879 20021120
- International Application: PCT/JP03/14117 WO 20031105
- International Announcement: WO2004/047183 WO 20040603
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A microelectronic device and a method for producing the device can overcome the disadvantages of known electronic devices composed of carbon molecules, and can deliver performance superior to the known devices. An insulated-gate field-effect transistor includes a multi-walled carbon nanotube (10) having an outer semiconductive carbon nanotube layer (1) and an inner metallic carbon nanotube layer (2) that is partially covered by the outer semiconductive carbon nanotube layer (1). A metal source electrode (3) and a metal drain electrode (5) are brought into contact with both ends of the semiconductive carbon nanotube layer (1) while a metal gate electrode (4) is brought into contact with the metallic carbon nanotube layer (2). The space between the semiconductive carbon nanotube layer (1) and the metallic carbon nanotube layer (2) is used as a gate insulating layer. Two layers including the outer semiconductive carbon nanotube layer (1) and the inner metallic carbon nanotube layer (2) are selected from carbon nanotube layers of a multi-walled carbon nanotube. These layers are processed into a form suitable for use as the multi-walled carbon nanotube (10).
Public/Granted literature
- US20060205105A1 Electronic device and it's manufacturing method Public/Granted day:2006-09-14
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