Invention Grant
- Patent Title: Image sensor and method for fabricating the same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US11319495Application Date: 2005-12-29
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Publication No.: US07719072B2Publication Date: 2010-05-18
- Inventor: Sang Sik Kim
- Applicant: Sang Sik Kim
- Applicant Address: KR Seoul
- Assignee: Dongbu Electronics Co., Ltd.
- Current Assignee: Dongbu Electronics Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2004-0116510 20041230
- Main IPC: H01L31/0232
- IPC: H01L31/0232
Abstract:
The image sensor includes a semiconductor substrate, a first color filter pattern formed over the substrate, the first color filter pattern having an edge portion with a first slope, and a second color filter pattern formed next to the first color filter pattern, the second color filter pattern having an edge portion with a second slope.
Public/Granted literature
- US20060145277A1 Image sensor and method for fabricating the same Public/Granted day:2006-07-06
Information query
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