Invention Grant
- Patent Title: Vent chamber
- Patent Title (中): 排气室
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Application No.: US10947514Application Date: 2004-09-22
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Publication No.: US07726786B2Publication Date: 2010-06-01
- Inventor: Patrick J. Therien , David N. Olsen , Curt G. Gonzales , Steven N Miller
- Applicant: Patrick J. Therien , David N. Olsen , Curt G. Gonzales , Steven N Miller
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: B41J2/175
- IPC: B41J2/175
Abstract:
A device is disclosed. In one example embodiment, the device includes a fluid ejection mechanism, a reservoir, and a pump configured to pump fluid between the fluid ejection mechanism and the reservoir. A vent chamber is fluidly coupled to the reservoir.
Public/Granted literature
- US20060061637A1 Vent chamber Public/Granted day:2006-03-23
Information query
IPC分类:
