Invention Grant
- Patent Title: Collecting unit for semiconductor process
- Patent Title (中): 半导体工艺采集单元
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Application No.: US11905990Application Date: 2007-10-05
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Publication No.: US07727296B2Publication Date: 2010-06-01
- Inventor: Yukio Tojo , Naotaka Noro , Yoshiyuki Fujita , Yuji Ito
- Applicant: Yukio Tojo , Naotaka Noro , Yoshiyuki Fujita , Yuji Ito
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2006-276462 20061010
- Main IPC: B01D45/00
- IPC: B01D45/00

Abstract:
A collecting unit is disposed on an exhaust passage of a semiconductor processing apparatus to collect by-products contained in an exhaust gas. The collecting unit includes a trap body detachably disposed inside a casing and configured to collect a part of the by-products. The trap body includes fins arrayed in a flow direction of the exhaust gas and having a surface on which a part of the by-products is deposited and trapped. The collecting unit further includes a receiving mechanism disposed inside the casing and configured to receive a part of the by-products that peels off from the trap body or an inner surface of the casing to prevent this part from being deposited on a bottom of the casing. The receiving mechanism is configured to allow a part of the by-products held thereon to be in contact with a cleaning gas from above and from below.
Public/Granted literature
- US20080104935A1 Collecting unit for semiconductor process Public/Granted day:2008-05-08
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