Invention Grant
- Patent Title: Apparatus for pulling single crystal by CZ method
- Patent Title (中): 用CZ法拉单晶的装置
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Application No.: US11809357Application Date: 2007-05-31
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Publication No.: US07727334B2Publication Date: 2010-06-01
- Inventor: Hiroshi Inagaki , Shigeki Kawashima , Makoto Kamogawa , Toshirou Kotooka , Toshiaki Saishoji , Daisuke Ebi , Kentaro Nakamura , Kengo Hayashi , Yoshinobu Hiraishi , Shigeo Morimoto , Hiroshi Monden , Tadayuki Hanamoto , Tadashi Hata
- Applicant: Hiroshi Inagaki , Shigeki Kawashima , Makoto Kamogawa , Toshirou Kotooka , Toshiaki Saishoji , Daisuke Ebi , Kentaro Nakamura , Kengo Hayashi , Yoshinobu Hiraishi , Shigeo Morimoto , Hiroshi Monden , Tadayuki Hanamoto , Tadashi Hata
- Applicant Address: JP Nagasaki
- Assignee: Sumco Techxiv Corporation
- Current Assignee: Sumco Techxiv Corporation
- Current Assignee Address: JP Nagasaki
- Agency: Husch Blackwell Sanders LLP Welsh & Katz
- Priority: JP2000-023527 20000201; JP2000-054893 20000229; JP2000-054894 20000229; JP2000-054895 20000229; JP2000-054896 20000229
- Main IPC: C30B15/20
- IPC: C30B15/20

Abstract:
In a Czochralski (CZ) single crystal puller equipped with a cooler and a thermal insulation member, which are to be disposed in a CZ furnace, smooth recharge and additional charge of material are made possible. Further, elimination of dislocations from a silicon seed crystal by use of the Dash's neck method can be performed smoothly. To these ends, there is provided a CZ single crystal puller, wherein a cooler and a thermal insulation member are immediately moved upward away from a melt surface during recharge or additional charge of material or during elimination of dislocations from a silicon seed crystal by use of the Dash's neck method.
Public/Granted literature
- US20070256625A1 Apparatus for pulling single crystal by CZ method Public/Granted day:2007-11-08
Information query
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