Invention Grant
- Patent Title: Method and an arrangement to determine a running value of the gap during the electrochemical machining
- Patent Title (中): 在电化学加工期间确定间隙的运行值的方法和装置
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Application No.: US10515083Application Date: 2003-04-25
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Publication No.: US07727375B2Publication Date: 2010-06-01
- Inventor: Alexandr Nikolaevich Zajcev , Igor Leonidovich Agafonov , Rafail Ramzisovich Muchutdinov , Nasich Zijatdinovich Gimaev , Viktor Nikolaevich Kucenko , Aleksandr Leonidovich Belogorsky
- Applicant: Alexandr Nikolaevich Zajcev , Igor Leonidovich Agafonov , Rafail Ramzisovich Muchutdinov , Nasich Zijatdinovich Gimaev , Viktor Nikolaevich Kucenko , Aleksandr Leonidovich Belogorsky
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- Priority: WOPCT/IB02/02809 20020523
- International Application: PCT/IB03/01846 WO 20030425
- International Announcement: WO03/099499 WO 20031204
- Main IPC: B23H7/18
- IPC: B23H7/18

Abstract:
A method and an arrangement (1) for determining an actual value of the gap (4) between the work piece (2) and the electrode (3) during a process of electrochemical machining. According to the invention first process control means (30) are arranged to supply a set of machining current pulses (Im) to the electrode and the work piece. Second process control means (32) are arranged to perform a measurement of an operational parameter (U) representing a value of the gap (4) in real time under operational conditions. The second process control means (32) comprise means to determine the actual value of the gap (55a) based on the measurement of the operational parameter and logical unit (55b) to actuate the positioning means (8) to translate the electrode (3) in case the measured value of the gap deviates from the preset value of the gap.
Public/Granted literature
- US20050178671A1 Method and an arrangement to determine a running value of the gap during the electrochemical machining Public/Granted day:2005-08-18
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