Invention Grant
- Patent Title: Plasma reaction vessel, and method of producing the same
- Patent Title (中): 等离子体反应容器及其制造方法
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Application No.: US10544527Application Date: 2004-02-12
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Publication No.: US07727487B2Publication Date: 2010-06-01
- Inventor: Yuichiro Imanishi , Shinichi Miwa , Fumio Abe , Yukio Miyairi
- Applicant: Yuichiro Imanishi , Shinichi Miwa , Fumio Abe , Yukio Miyairi
- Applicant Address: JP Nagoya JP Tokyo
- Assignee: NGK Insulators, Ltd.,Honda Motor Co., Ltd.
- Current Assignee: NGK Insulators, Ltd.,Honda Motor Co., Ltd.
- Current Assignee Address: JP Nagoya JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-034425 20030212
- International Application: PCT/JP2004/001452 WO 20040212
- International Announcement: WO2004/072445 WO 20040826
- Main IPC: B01J19/08
- IPC: B01J19/08

Abstract:
In the plasma reaction vessel (1) of the invention, two or more laminate-structures (6) having ceramic formed bodies (3, 4) in which a plasma generating electrode (2) capable of generating plasma is formed in two-tape-form, and an electrically continuous film-like electrically conductive electrode (5) held between the two ceramic formed bodies (3, 4) are formed in such a manner as to form a plasma generating space (7) containing mutual laminate planes therein. Of the electrically conductive electrodes (5), adjacent ones are capable of having electric discharge produced therebetween so as to generate the plasma in the plasma generating space (7) and of generating uniform stabilized plasma at low electric power, it being possible to reduce a passage resistance to a gas passing therein.
Public/Granted literature
- US20060133970A1 Plasma reaction vessel, and method of producing the same Public/Granted day:2006-06-22
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