Invention Grant
- Patent Title: System and method for providing phase shift mask passivation layer
- Patent Title (中): 提供相移掩模钝化层的系统和方法
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Application No.: US11689242Application Date: 2007-03-21
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Publication No.: US07727682B2Publication Date: 2010-06-01
- Inventor: Hung-Ting Pan , Ken Wu , Luke Hsu , Yao-Ching Ku
- Applicant: Hung-Ting Pan , Ken Wu , Luke Hsu , Yao-Ching Ku
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
System and method for providing a passivation layer for a phase shift mask (“PSM”) are described. In one embodiment, a PSM comprises a transparent substrate; a phase shift pattern disposed on the transparent substrate; and a passivation layer disposed to substantially cover exposed surfaces of at least a portion of the phase shift pattern.
Public/Granted literature
- US20080233486A1 System and Method for Providing Phase Shift Mask Passivation Layer Public/Granted day:2008-09-25
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