Invention Grant
- Patent Title: Method for fabricating dual damascene structures
- Patent Title (中): 双镶嵌结构的制作方法
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Application No.: US12121502Application Date: 2008-05-15
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Publication No.: US07727708B2Publication Date: 2010-06-01
- Inventor: Matthew E. Colburn , Dario L. Goldfarb
- Applicant: Matthew E. Colburn , Dario L. Goldfarb
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
A method for fabricating a dual damascene structure includes providing a multi-layer photoresist stack comprising a first photoresist layer and a second photoresist layer, wherein each photoresist layer has a distinct dose-to-clear value, exposing said photoresist stack to one or more predetermined patterns of light, and developing said photo-resist layers to form a multi-tiered structure in the photo-resist layers.
Public/Granted literature
- US20080214011A1 Method for Fabricating Dual Damascene Structures Public/Granted day:2008-09-04
Information query
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