Invention Grant
- Patent Title: Exponentially doped layers in inverted metamorphic multijunction solar cells
- Patent Title (中): 倒置变质多结太阳能电池中的指数掺杂层
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Application No.: US12187454Application Date: 2008-08-07
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Publication No.: US07727795B2Publication Date: 2010-06-01
- Inventor: Mark A. Stan , Arthur Cornfeld , Vance Ley
- Applicant: Mark A. Stan , Arthur Cornfeld , Vance Ley
- Applicant Address: US NM Albuquerque
- Assignee: Encore Solar Power, Inc.
- Current Assignee: Encore Solar Power, Inc.
- Current Assignee Address: US NM Albuquerque
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of forming a multijunction solar cell including an upper subcell, a middle subcell, and a lower subcell, including providing first substrate for the epitaxial growth of semiconductor material; forming a first solar subcell on the substrate having a first band gap; forming a second solar subcell over the first solar subcell having a second band gap smaller than the first band gap; forming a grading interlayer over the second subcell, the grading interlayer having a third band gap greater than the second band gap; and forming a third solar subcell over the grading interlayer having a fourth band gap smaller than the second band gap such that the third subcell is lattice mis-matched with respect to the second subcell, wherein at least one of the bases of a solar subcell has an exponentially doped profile.
Public/Granted literature
- US20090155951A1 Exponentially Doped Layers In Inverted Metamorphic Multijunction Solar Cells Public/Granted day:2009-06-18
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