Invention Grant
- Patent Title: Microelectronic package interconnect and method of fabrication thereof
- Patent Title (中): 微电子封装互连及其制造方法
-
Application No.: US12218161Application Date: 2008-07-10
-
Publication No.: US07727814B2Publication Date: 2010-06-01
- Inventor: Daewoong Suh , Amram Eitan , Yongki Min
- Applicant: Daewoong Suh , Amram Eitan , Yongki Min
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agent Kenneth A. Nelson
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/44

Abstract:
A method of interconnecting and an interconnect is provided to connect a first component and a second component of an integrated circuit. The interconnect includes a plurality of Carbon Nanotubes (CNTs), which provide a conducting path between the first component and the second component. The interconnect further includes a passivation layer to fill the gaps between adjacent CNTs. A method of producing Anisotropic Conductive Film (ACF) and an ACF is provided. The ACF includes a plurality of CNTs, which provide a conducting path between a first side of the ACF and a second side of the ACF. The sides of the ACF can also include a conductive curable adhesive layer. In an embodiment, the conductive curable adhesive layer can incorporate a B-stage cross-linkable polymer and silver particles.
Public/Granted literature
- US20090068830A1 Microelectronic package interconnect and method of fabrication thereof Public/Granted day:2009-03-12
Information query
IPC分类: