Invention Grant
- Patent Title: Precision targeting
- Patent Title (中): 精准定位
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Application No.: US11243842Application Date: 2005-10-05
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Publication No.: US07728264B2Publication Date: 2010-06-01
- Inventor: Erwin De Sa , Ebbert Marvin , Rodney Krebs
- Applicant: Erwin De Sa , Ebbert Marvin , Rodney Krebs
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: The Noblitt Group, PLLC
- Main IPC: F42B15/01
- IPC: F42B15/01 ; F41G7/00 ; F42B15/00 ; G06F19/00

Abstract:
The disclosed system, device and method for targeting and measurement of stationary target locations in addition to prediction of moving target positions for given weapon intercept times generally includes: a target location system (TLS) configured with a computing device, a GPS receiver, mapping software, calibration software and digital filtering software. Disclosed features and specifications may be variously controlled, adapted or otherwise optionally modified to improve target acquisition and engagement. Exemplary embodiments of the present invention generally provide for improved accuracy of range finders, magnetometers and inclinometers as well as for improved prediction of moving target positions.
Public/Granted literature
- US20080001022A1 Precision targeting Public/Granted day:2008-01-03
Information query
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