Invention Grant
- Patent Title: Nitride semiconductor based bipolar transistor and the method of manufacture thereof
- Patent Title (中): 氮化物半导体双极晶体管及其制造方法
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Application No.: US11812591Application Date: 2007-06-20
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Publication No.: US07728359B2Publication Date: 2010-06-01
- Inventor: Tatsuo Morita , Tetsuzo Ueda
- Applicant: Tatsuo Morita , Tetsuzo Ueda
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Steptoe & Johnson LLP
- Priority: JP2006-173223 20060623
- Main IPC: H01L51/00
- IPC: H01L51/00

Abstract:
In a nitride semiconductor based bipolar transistor, a contact layer formed so as to contact an emitter layer is composed of n-type InAlGaN quaternary mixed crystals, the emitter layer and the contact layer are selectively removed so that the barrier height with the emitter formed thereon is small, and the ohmic electrode contact resistance can be lowered on the InAlGaN quaternary mixed crystals, for example, so that a WSi emitter electrode becomes an eave. A base electrode is formed by a self-aligned process using the emitter electrode as a mask. By such a configuration, the distance between the emitter and the edge of the base electrode is sufficiently shortened, and the base resistance can be lowered. As a result, a bipolar transistor having favorable high-frequency characteristics can be realized.
Public/Granted literature
- US20080121938A1 Nitride semiconductor based bipolar transistor and the method of manufacture thereof Public/Granted day:2008-05-29
Information query
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