Stage devices for various uses including use as a reticle stage or substrate stage in a microlithography system. An exemplary device includes a carrier and multiple linear EM actuators that couple the carrier monolithically to a base. The linear EM actuators collectively provide controlled movability of the carrier relative to the base in all six DOFs (X, Y, Z, θX, θY, θZ). The multiple linear EM actuators comprise at least one multiple-DOF linear actuator but fewer than six linear EM actuators. For example, the stage device can have two two-DOF linear actuators providing respective motions of the carrier in the X, Y and Y, Z DOFs (and collectively in all six DOFs) or can have two two-DOE linear actuators providing motions of the carrier in the Y, Z, θX, θY, and θZ DOFs and a one-DOF linear actuator providing motions in the X DOF.