Invention Grant
- Patent Title: Reflective loop system producing incoherent radiation
- Patent Title (中): 产生不相干辐射的反射环系统
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Application No.: US11447289Application Date: 2006-06-06
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Publication No.: US07728954B2Publication Date: 2010-06-01
- Inventor: Johannes Jacobus Matheus Baselmans , Kenji Ueyama
- Applicant: Johannes Jacobus Matheus Baselmans , Kenji Ueyama
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; H01S3/10
Abstract:
A system and method are used to form incoherent beams from a coherent beam. A system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or partially coherent beam. The reflective loop system received the partially coherent beam and reflects the partially coherent beam through a loop, or alternatively through non-overlapping loops, to form an incoherent beam.
Public/Granted literature
- US20070279611A1 Reflective loop system producing incoherent radiation Public/Granted day:2007-12-06
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