Invention Grant
US07728958B2 Condition assessment method for a structure including a semiconductor material 有权
包括半导体材料的结构的条件评估方法

Condition assessment method for a structure including a semiconductor material
Abstract:
An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at least one of the following occurs: an external force is received by the second portion of the structure and an internal condition occurs in the target portion. The system and method further has a grating shaped and located to produce a first optical interference pattern when the target portion and the grating are exposed to non-invasive illumination and when the target portion has the first feature. Further implementations use a second grating spaced apart from the first grating.
Information query
Patent Agency Ranking
0/0