Invention Grant
US07729568B2 Optical device having stress layer inducing refraction index variation in a partial region of a substrate by photoelastic effect 有权
具有应力层的光学器件通过光弹性效应在衬底的部分区域中引起折射率变化

Optical device having stress layer inducing refraction index variation in a partial region of a substrate by photoelastic effect
Abstract:
The application relates to an optical device for enhancing the stress to be generated in a substrate in comparison with a conventional technique. To this end, the optical device includes a substrate having a photoelastic effect, a first stress layer formed on a first face of the substrate and having a pattern for generating stress which induces refraction index variation by the photoelastic effect in a partial region in the substrate, and a second stress layer formed on a second face which is a reverse face to the first face of the substrate and configured to generate stress for restoring the shape from the deformation caused by the stress generated in the substrate by the first stress layer in the substrate.
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