Invention Grant
- Patent Title: Method of producing planar multimode optical waveguide using direct photopatterning
- Patent Title (中): 使用直接光图案制作平面多模光波导的方法
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Application No.: US11794567Application Date: 2005-12-28
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Publication No.: US07729587B2Publication Date: 2010-06-01
- Inventor: Byeong-Soo Bae , Dong-Jun Kang , Jin-Ki Kim , Woo-Soo Kim
- Applicant: Byeong-Soo Bae , Dong-Jun Kang , Jin-Ki Kim , Woo-Soo Kim
- Applicant Address: KR Daejeon
- Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR Daejeon
- Agency: The Nath Law Group
- Agent Susanne M. Hopkins; Derek Richmond
- Priority: KR10-2005-0004320 20050117
- International Application: PCT/KR2005/004620 WO 20051228
- International Announcement: WO2006/075849 WO 20060720
- Main IPC: G02B6/00
- IPC: G02B6/00

Abstract:
Disclosed is a method of producing a planar multimode optical waveguide by direct photo-patterning and, more particularly, to an optical waveguide material and a method of producing the same. It is possible to control the refractive index of the optical waveguide, and the optical waveguide has a desirable refractive index distribution throughout different dielectric regions. In the method, it is unnecessary to conduct processes of forming a clad layer and of etching a core layer, thus a production process is simplified. The method comprises coating a photosensitive hybrid material having a refractive index or a volume changed by light radiation, in a thickness of 10 microns or more, and radiating light having a predetermined wavelength onto the coated photosensitive hybrid material to form the multimode optical waveguide due to a change in refractive index of a portion onto which light is radiated.
Public/Granted literature
- US20090142025A1 Method of Producing Planar Multimode Optical Waveguide Using Direct Photopatterning Public/Granted day:2009-06-04
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