Invention Grant
- Patent Title: Flowmeter and flow control device
- Patent Title (中): 流量计和流量控制装置
-
Application No.: US12070303Application Date: 2008-02-14
-
Publication No.: US07730777B2Publication Date: 2010-06-08
- Inventor: Masanori Anzai , Shoji Kamiunten
- Applicant: Masanori Anzai , Shoji Kamiunten
- Applicant Address: JP Tokyo
- Assignee: Yamatake Corporation
- Current Assignee: Yamatake Corporation
- Current Assignee Address: JP Tokyo
- Agency: Frishauf, Holtz, Goodman & Chick, P.C.
- Priority: JP2007-037765 20070219
- Main IPC: G01F1/68
- IPC: G01F1/68

Abstract:
A simply structured flowmeter in which an influence of a dilatational wave on a thermal flow rate sensor is suppressed, and measurement accuracy is enhanced.The flowmeter has not only the thermal flow rate sensor that is placed to face a flow channel and detects a flow rate of fluid flowing through the flow channel but also a micro path (for example, narrow pipe) that is provided to the flow channel and blocks a dilatational wave created in the flow channel from being transmitted to the thermal flow rate sensor.
Public/Granted literature
- US20080196493A1 Flowmeter and flow control device Public/Granted day:2008-08-21
Information query