Invention Grant
- Patent Title: Nitrogen semiconductor compound and device fabricated using the same
- Patent Title (中): 氮半导体化合物和使用其制造的器件
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Application No.: US11362035Application Date: 2006-02-27
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Publication No.: US07731796B2Publication Date: 2010-06-08
- Inventor: Jean Roncali , Antonio Cravino , Philippe Leriche , Pierre Frere , Sophie Roquet
- Applicant: Jean Roncali , Antonio Cravino , Philippe Leriche , Pierre Frere , Sophie Roquet
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2005-0089797 20050927
- Main IPC: C30B25/00
- IPC: C30B25/00 ; C30B28/14 ; H01L23/52 ; H01L29/40

Abstract:
Disclosed herein are a novel nitrogen semiconductor compound simultaneously including groups with different electrical properties and a device fabricated using the nitrogen semiconductor compound as an organic semiconductor material or a hole conducting material. The nitrogen semiconductor compound can be spin-coated at room temperature when applied to the fabrication of the device, and has superior electrical conductivity and photovoltaic properties.
Public/Granted literature
- US20070068450A1 Novel nitrogen semiconductor compound and device fabricated using the same Public/Granted day:2007-03-29
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