Invention Grant
- Patent Title: Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
- Patent Title (中): 用于选择性放置亲水结构的光敏自组装单层
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Application No.: US11870167Application Date: 2007-10-10
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Publication No.: US07732119B2Publication Date: 2010-06-08
- Inventor: Ali Afzali-Ardakani , Teresita O. Graham , James B. Hannon , George S. Tulevski
- Applicant: Ali Afzali-Ardakani , Teresita O. Graham , James B. Hannon , George S. Tulevski
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scull, Scott, Murphy & Presser, P.C.
- Agent Vazken Alexanian
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; G03F7/004

Abstract:
A photosensitive monolayer is self-assembled on an oxide surface. The chemical compound of the photosensitive monolayer has three components. A first end group provides covalent bonds with the oxide surface for self assembly on the oxide surface. A photosensitive group that dissociates upon exposure to ultraviolet radiation is linked to the first end group. A second end group linked to the photosensitive group provides hydrophobicity. Upon exposure to the ultraviolet radiation, the dissociated photosensitive group is cleaved and forms a hydrophilic derivative in the exposed region, rendering the exposed region hydrophilic. Carbon nanotubes or nanocrystals applied in an aqueous dispersion are selectively attracted to the hydrophilic exposed region to from electrostatic bonding with the hydrophilic surface of the cleaved photosensitive group.
Public/Granted literature
- US20090098347A1 PHOTOSENSITIVE SELF-ASSEMBLED MONOLAYER FOR SELECTIVE PLACEMENT OF HYDROPHILIC STRUCTURES Public/Granted day:2009-04-16
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