Invention Grant
- Patent Title: Quantum dot based optoelectronic device and method of making same
- Patent Title (中): 基于量子点的光电器件及其制作方法
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Application No.: US11169196Application Date: 2005-06-27
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Publication No.: US07732237B2Publication Date: 2010-06-08
- Inventor: Ya-Hong Xie
- Applicant: Ya-Hong Xie
- Applicant Address: US CA Oakland
- Assignee: The Regents of the University of California
- Current Assignee: The Regents of the University of California
- Current Assignee Address: US CA Oakland
- Agency: Vista IP Group LLP
- Main IPC: H01L21/18
- IPC: H01L21/18

Abstract:
A method of forming an optically active region on a silicon substrate includes the steps of epitaxially growing a silicon buffer layer on the silicon substrate and epitaxially growing a SiGe cladding layer having a plurality of arrays of quantum dots disposed therein, the quantum dots being formed from a compound semiconductor material having a lattice mismatch with the silicon buffer layer. The optically active region may be incorporated into devices such as light emitting diodes, laser diodes, and photodetectors.
Public/Granted literature
- US20060289855A1 Quantum dot based optoelectronic device and method of making same Public/Granted day:2006-12-28
Information query
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