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US07732237B2 Quantum dot based optoelectronic device and method of making same 有权
基于量子点的光电器件及其制作方法

Quantum dot based optoelectronic device and method of making same
Abstract:
A method of forming an optically active region on a silicon substrate includes the steps of epitaxially growing a silicon buffer layer on the silicon substrate and epitaxially growing a SiGe cladding layer having a plurality of arrays of quantum dots disposed therein, the quantum dots being formed from a compound semiconductor material having a lattice mismatch with the silicon buffer layer. The optically active region may be incorporated into devices such as light emitting diodes, laser diodes, and photodetectors.
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