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US07732250B2 Methods of forming phase changeable layers including protruding portions in electrodes thereof 有权
形成其电极中的突出部分的相变层的方法

Methods of forming phase changeable layers including protruding portions in electrodes thereof
Abstract:
A method of forming a structure in a phase changeable memory cell can include forming a bottom electrode having an interlayer dielectric layer thereon, the bottom electrode having a recess therein that extends beyond a boundary between the bottom electrode and the interlayer dielectric. A phase changeable layer can be formed in the recess including a protruding potion of the phase changeable layer that protrudes into the bottom electrode beyond the boundary.
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