Invention Grant
- Patent Title: Methods of forming phase changeable layers including protruding portions in electrodes thereof
- Patent Title (中): 形成其电极中的突出部分的相变层的方法
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Application No.: US12114443Application Date: 2008-05-02
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Publication No.: US07732250B2Publication Date: 2010-06-08
- Inventor: Se-Ho Lee
- Applicant: Se-Ho Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR2002-65456 20021025
- Main IPC: H01L21/06
- IPC: H01L21/06

Abstract:
A method of forming a structure in a phase changeable memory cell can include forming a bottom electrode having an interlayer dielectric layer thereon, the bottom electrode having a recess therein that extends beyond a boundary between the bottom electrode and the interlayer dielectric. A phase changeable layer can be formed in the recess including a protruding potion of the phase changeable layer that protrudes into the bottom electrode beyond the boundary.
Public/Granted literature
- US20080206921A1 METHODS OF FORMING PHASE CHANGEABLE LAYERS INCLUDING PROTRUDING PORTIONS IN ELECTRODES THEREOF Public/Granted day:2008-08-28
Information query
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