Invention Grant
- Patent Title: Programmable via structure for three dimensional integration technology
- Patent Title (中): 可编程通孔结构,用于三维集成技术
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Application No.: US12178921Application Date: 2008-07-24
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Publication No.: US07732798B2Publication Date: 2010-06-08
- Inventor: Bruce G. Elmegreen , Lia Krusin-Elbaum , Chung Hon Lam , Dennis M. Newns , Matthew R. Wordeman , Albert M. Young
- Applicant: Bruce G. Elmegreen , Lia Krusin-Elbaum , Chung Hon Lam , Dennis M. Newns , Matthew R. Wordeman , Albert M. Young
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A programmable link structure for use in three dimensional integration (3DI) semiconductor devices includes a via filled at least in part with a phase change material (PCM) and a heating device proximate the PCM. The heating device is configured to switch the conductivity of a transformable portion of the PCM between a lower resistance crystalline state and a higher resistance amorphous state. Thereby, the via defines a programmable link between an input connection located at one end thereof and an output connection located at another end thereof.
Public/Granted literature
- US20090072213A1 Programmable Via Structure for Three Dimensional Integration Technology Public/Granted day:2009-03-19
Information query
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