Invention Grant
US07732817B2 Pattern formed structure, method of forming pattern, device, electrooptical device and electronic equipment
失效
图案形成结构，图案形成方法，装置，电光装置和电子设备
- Patent Title: Pattern formed structure, method of forming pattern, device, electrooptical device and electronic equipment
- Patent Title (中): 图案形成结构，图案形成方法，装置，电光装置和电子设备
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Application No.: US11213789Application Date: 2005-08-30
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Publication No.: US07732817B2Publication Date: 2010-06-08
- Inventor: Toshimitsu Hirai , Toshihiro Ushiyama
- Applicant: Toshimitsu Hirai , Toshihiro Ushiyama
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: H01L29/04
- IPC: H01L29/04
Abstract:
A partition-wall structure having a concave portion corresponding to a pattern formed by a functional liquid, including: a first concave portion provided corresponding to a first pattern; a second concave portion provided corresponding to a second pattern that is coupled to the first pattern and whose width is smaller than a width of the first pattern; and a convex portion provided in the first pattern.
Public/Granted literature
Information query
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