Invention Grant
- Patent Title: Semiconductor memory device including a semiconductor film made of a material having a spontaneous polarization and method for fabricating the same
- Patent Title (中): 包括由具有自发极化的材料制成的半导体膜的半导体存储器件及其制造方法
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Application No.: US12033481Application Date: 2008-02-19
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Publication No.: US07732847B2Publication Date: 2010-06-08
- Inventor: Hiroyuki Tanaka , Yukihiro Kaneko , Yoshihisa Kato
- Applicant: Hiroyuki Tanaka , Yukihiro Kaneko , Yoshihisa Kato
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-107088 20070416
- Main IPC: H01L31/113
- IPC: H01L31/113

Abstract:
A semiconductor memory device is composed of a field effect transistor using the interface between a ferroelectric film and a semiconductor film as the channel and including a gate electrode to which a voltage for controlling the polarization state of the ferroelectric film is applied and source/drain electrodes provided on both ends of the channel to detect a current flowing in the channel in accordance with the polarization state. The semiconductor film is made of a material having a spontaneous polarization and the direction of the spontaneous polarization is parallel with the interface between the ferroelectric film and the semiconductor film.
Public/Granted literature
- US20080251816A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2008-10-16
Information query
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