Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US10521941Application Date: 2002-11-28
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Publication No.: US07732868B2Publication Date: 2010-06-08
- Inventor: Tetsuro Asano , Mikito Sakakibara , Toshikazu Hirai
- Applicant: Tetsuro Asano , Mikito Sakakibara , Toshikazu Hirai
- Applicant Address: JP Osaka
- Assignee: Sanyo Electric Co., Ltd.
- Current Assignee: Sanyo Electric Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JP2002-262845 20020909
- International Application: PCT/JP02/12424 WO 20021128
- International Announcement: WO2004/027869 WO 20040401
- Main IPC: H01L29/812
- IPC: H01L29/812

Abstract:
A protecting element, comprising a first n+-type region, an insulating region, and a second n+-type region, is connected in parallel between two terminals of an FET. Since discharge across the first and second n+ regions is enabled, electrostatic energy that reaches the operating region of the FET can be attenuated without increasing the parasitic capacitance.
Public/Granted literature
- US20060151816A1 Semiconductor device Public/Granted day:2006-07-13
Information query
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