Invention Grant
US07733453B2 Method of fabricating a liquid crystal display device using a three mask process and double layer electrodes 有权
使用三掩模处理和双层电极制造液晶显示装置的方法

  • Patent Title: Method of fabricating a liquid crystal display device using a three mask process and double layer electrodes
  • Patent Title (中): 使用三掩模处理和双层电极制造液晶显示装置的方法
  • Application No.: US11312715
    Application Date: 2005-12-21
  • Publication No.: US07733453B2
    Publication Date: 2010-06-08
  • Inventor: Byung Chul Ahn
  • Applicant: Byung Chul Ahn
  • Applicant Address: KR Seoul
  • Assignee: LG Display Co., Ltd.
  • Current Assignee: LG Display Co., Ltd.
  • Current Assignee Address: KR Seoul
  • Agency: McKenna Long & Aldridge
  • Priority: KR10-2004-118570 20041231
  • Main IPC: G02F1/13
  • IPC: G02F1/13 G02F1/1343
Method of fabricating a liquid crystal display device using a three mask process and double layer electrodes
Abstract:
A fringe field switching thin film transistor substrate includes a gate electrode connected to the gate line, a source electrode connected to the data line, a drain electrode opposed to the pixel electrode and a semiconductor layer defining a channel between the source electrode and the drain electrode. A common electrode extends from the common line into the pixel area. A pixel electrode extends from the drain electrode into the pixel area overlapping the common electrode with the gate insulating film. The gate line and the common line are formed from a first conductive layer group having double conductive layers, and the common electrode is formed by an extension of the lowermost layer of the common line. The data line, the source electrode and the drain electrode are formed of a second conductive layer group having double conductive layers.
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