Invention Grant
- Patent Title: Aligner and self-cleaning method for aligner
- Patent Title (中): 对准器的对准器和自清洁方法
-
Application No.: US11285211Application Date: 2005-11-23
-
Publication No.: US07733460B2Publication Date: 2010-06-08
- Inventor: Ryoichi Aoyama , Daigo Hoshino , Toshio Onodera , Yasuhiro Yamamoto
- Applicant: Ryoichi Aoyama , Daigo Hoshino , Toshio Onodera , Yasuhiro Yamamoto
- Applicant Address: JP Tokyo
- Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Rabin & Berdo, P.C.
- Priority: JP2004-338573 20041124
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42

Abstract:
When a self-cleaning method for an aligner is carried out, a reflecting plate having a convex lens portion is set in an original plate holder, and exposure light rays are irradiated from a light source. The surface of the lens portion is coated with a reflective film. The light rays are reflected by the reflecting plate, diffused, and emitted onto the surface of a condenser lens, thereby breaking down and removing contaminants that are adhered to the surface of the condenser lens. The light rays also enter the interior of the condenser lens to clean away contaminants that are adhered to locations other than a normal exposure path. When a concave mirror and/or a reflecting plate having 50% transmittance is used as the reflecting plate, the emission range of the light rays (i.e., the locations that are cleaned) can be changed.
Public/Granted literature
- US20070240735A1 Aligner and self-cleaning method for aligner Public/Granted day:2007-10-18
Information query