Invention Grant
- Patent Title: Method and apparatus for reducing microlens surface reflection
- Patent Title (中): 减少微透镜表面反射的方法和装置
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Application No.: US11201291Application Date: 2005-08-11
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Publication No.: US07733567B2Publication Date: 2010-06-08
- Inventor: Jiutao Li , Jin Li , Ulrich C. Boettiger
- Applicant: Jiutao Li , Jin Li , Ulrich C. Boettiger
- Applicant Address: KY Grand Cayman
- Assignee: Aptina Imaging Corporation
- Current Assignee: Aptina Imaging Corporation
- Current Assignee Address: KY Grand Cayman
- Agency: Dickstein Shapiro LLP
- Main IPC: G02B27/10
- IPC: G02B27/10

Abstract:
A microlens has a surface with an effective index of refraction close to the index of air to reduce reflection caused by change in indices of refraction from microlens to air. The microlens having an index of refraction approximately the same as that of air is obtained by providing a rough or bumpy lens-air surface on the microlens. Features protrude from the surface of a microlens to create the rough surface and preferably have a length of greater or equal to a wavelength of light and a width of less than a sub-wavelength of light, from about 1/10 to ¼ of the wavelength of light. The features may be of any suitable shape, including but not limited to triangular, cylindrical, rectangular, trapezoidal, or spherical and may be formed by a variety of suitable processes, including but not limited to mask and etching, lithography, spray-on beads, sputtering, and growing.
Public/Granted literature
- US20070035844A1 Method and apparatus for reducing microlens surface reflection Public/Granted day:2007-02-15
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