Invention Grant
US07733700B2 Method and structures for highly efficient hot carrier injection programming for non-volatile memories 有权
用于非易失性存储器的高效热载流子注入程序的方法和结构

  • Patent Title: Method and structures for highly efficient hot carrier injection programming for non-volatile memories
  • Patent Title (中): 用于非易失性存储器的高效热载流子注入程序的方法和结构
  • Application No.: US11779838
    Application Date: 2007-07-18
  • Publication No.: US07733700B2
    Publication Date: 2010-06-08
  • Inventor: Lee Wang
  • Applicant: Lee Wang
  • Applicant Address: US CA Diamond Bar
  • Assignee: Flashsilicon, Inc.
  • Current Assignee: Flashsilicon, Inc.
  • Current Assignee Address: US CA Diamond Bar
  • Agency: Haynes and Boone, LLP
  • Main IPC: G11C11/34
  • IPC: G11C11/34
Method and structures for highly efficient hot carrier injection programming for non-volatile memories
Abstract:
A method programs a memory cell by controlling a reverse bias voltage across the PN junction between a source electrode of a MOSFET in the memory cell and the substrate, and pulling back the pinch-off point of the inversion region toward the source electrode, thereby increasing the programming efficiency of the memory cell. The method applies the main positive supply voltage Vcc to, the drain electrode of the memory cell from the chip main voltage supply, rather than the conventional method of using a higher voltage than Vcc. To optimize the programming condition, the source voltage and the substrate voltage are adjusted to achieve the maximum threshold voltage shifts under the same applied gate voltage pulse condition (i.e. using the gate pulse with the same voltage amplitude and duration regardless of the source voltage and the substrate voltage). The substrate voltage to the drain voltage can not exceed the avalanche multiplication junction breakdown for a small programming current during the bias voltage adjustment.
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