Invention Grant
- Patent Title: Extreme UV and soft X ray generator
- Patent Title (中): 极端的UV和软X射线发生器
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Application No.: US10567038Application Date: 2004-07-29
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Publication No.: US07734014B2Publication Date: 2010-06-08
- Inventor: Klaus Bergmann , Willi Neff
- Applicant: Klaus Bergmann , Willi Neff
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- Priority: DE10336273 20030807
- International Application: PCT/IB2004/051323 WO 20040729
- International Announcement: WO2005/015602 WO 20050217
- Main IPC: H01J35/06
- IPC: H01J35/06 ; H01J35/02 ; G21G4/00

Abstract:
A gas discharge source, in particular, for generating extreme ultraviolet and/or soft X-radiation, has a gas-filled intermediate electrode space located between two electrodes, devices for the admission and evacuation of gas, and one electrode that has an opening that defines an axis of symmetry and is provided for the discharge of radiation. A diaphragm exhibits at least one opening on the axis of symmetry and operates as a differential pump stage, between the two electrodes.
Public/Granted literature
- US20080143228A1 Extreme Uv and Soft X Ray Generator Public/Granted day:2008-06-19
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