Invention Grant
US07735055B2 Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device
有权
制造光掩模数据的方法，光掩模制造方法以及制造半导体器件的方法
- Patent Title: Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device
- Patent Title (中): 制造光掩模数据的方法，光掩模制造方法以及制造半导体器件的方法
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Application No.: US11187003Application Date: 2005-07-22
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Publication No.: US07735055B2Publication Date: 2010-06-08
- Inventor: Tomohiro Tsutsui , Osamu Ikenaga
- Applicant: Tomohiro Tsutsui , Osamu Ikenaga
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2004-216374 20040723
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F19/00 ; G03F1/00 ; G21K5/00
Abstract:
A method of creating photo mask data includes preparing design data of a photo mask, generating drawing data of the photo mask by using the design data, generating inspection control information configured to control inspection of defect on the photo mask by using the drawing data, and generating drawing and inspection data including the drawing data and the inspection control information by providing the drawing data with the inspection control information.
Public/Granted literature
Information query
