Invention Grant
US07736835B2 Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
失效
含氟环状化合物，含氟聚合物化合物，使用其的抗蚀剂材料和形成图案的方法
- Patent Title: Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
- Patent Title (中): 含氟环状化合物，含氟聚合物化合物，使用其的抗蚀剂材料和形成图案的方法
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Application No.: US10589807Application Date: 2005-02-17
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Publication No.: US07736835B2Publication Date: 2010-06-15
- Inventor: Haruhiko Komoriya , Shinichi Sumida , Michitaka Ootani , Takeo Komata , Kazuhiko Maeda
- Applicant: Haruhiko Komoriya , Shinichi Sumida , Michitaka Ootani , Takeo Komata , Kazuhiko Maeda
- Applicant Address: JP Ube-shi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Ube-shi
- Agency: Crowell & Moring LLP
- Priority: JP2004-044142 20040220
- International Application: PCT/JP2005/002400 WO 20050217
- International Announcement: WO2005/080306 WO 20050901
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F18/20 ; C07C35/18
Abstract:
The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
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