Invention Grant
US07737055B2 Systems and methods for manipulating liquid films on semiconductor substrates
有权
用于操纵半导体衬底上的液膜的系统和方法
- Patent Title: Systems and methods for manipulating liquid films on semiconductor substrates
- Patent Title (中): 用于操纵半导体衬底上的液膜的系统和方法
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Application No.: US12272500Application Date: 2008-11-17
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Publication No.: US07737055B2Publication Date: 2010-06-15
- Inventor: Paul D. Shirley , Hiroyuki Mori
- Applicant: Paul D. Shirley , Hiroyuki Mori
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A semiconductor substrate undergoing processing to fabricate integrated circuit devices thereon is spun about a rotational axis while introducing liquid onto a surface of the substrate. An annular-shaped sheet of liquid is formed on the surface, the sheet of liquid having an inner diameter defining a liquid-free void. The size of a diameter of the void is reduced by manipulation of the annular-shaped sheet of liquid. The void may then be enlarged until the surface is substantially dry. The annular-shaped sheet of liquid may be formed and altered by selectively moving a contact area on the surface of the substrate on which the liquid is introduced. Systems for processing a substrate and configured to deposit and manipulate a sheet of liquid thereon are also disclosed.
Public/Granted literature
- US20090068848A1 SYSTEMS AND METHODS FOR MANIPULATING LIQUID FILMS ON SEMICONDUCTOR SUBSTRATES Public/Granted day:2009-03-12
Information query
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