Invention Grant
- Patent Title: Chemicallly amplified resist composition
- Patent Title (中): 化学放大抗蚀剂组合物
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Application No.: US11987672Application Date: 2007-12-03
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Publication No.: US07741007B2Publication Date: 2010-06-22
- Inventor: Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
- Applicant: Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-329132 20061206
- Main IPC: G03F7/004
- IPC: G03F7/004

Abstract:
The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (1) wherein R21, Q1, Q2, and A+ defined in the specification; (B) a salt represented by the formula (II): wherein R22, Q3, Q4, and A′+ are defined in the specification; and (C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
Public/Granted literature
- US20080213695A1 Chemically amplified resist composition Public/Granted day:2008-09-04
Information query
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