Invention Grant
US07741578B2 Gas shielding structure for use in solid free form fabrication systems
有权
用于固体自由形式制造系统的气体屏蔽结构
- Patent Title: Gas shielding structure for use in solid free form fabrication systems
- Patent Title (中): 用于固体自由形式制造系统的气体屏蔽结构
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Application No.: US11962901Application Date: 2007-12-21
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Publication No.: US07741578B2Publication Date: 2010-06-22
- Inventor: Robbie J. Adams , Michael W. Bruce , Tom Erion , John Tryniski
- Applicant: Robbie J. Adams , Michael W. Bruce , Tom Erion , John Tryniski
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Agency: Ingrassia Fisher & Lorenz, P.C.
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
A solid free form fabrication (SFF) system and method is used to fabricate a three-dimensional structure in a continuous manner from successive layers of feedstock material. The system includes a gas shielding structure that is configured to protect a targeted region from oxidation. The system further includes a positioning arm coupled to the deposition head and moveable to align the deposition head with a targeted region of the three-dimensional structure and a plurality of control components coupled to the positioning arm for controlling a position of the positioning arm and operation of the deposition head. The gas shielding structure is formed as either a parallelepiped structure or a half disc structure and may be conformable to at least one surface of the three-dimensional structure.
Public/Granted literature
- US20090102098A1 GAS SHIELDING STRUCTURE FOR USE IN SOLID FREE FORM FABRICATION SYSTEMS Public/Granted day:2009-04-23
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