Invention Grant
- Patent Title: Crack stop and moisture barrier
- Patent Title (中): 破裂停止和防潮
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Application No.: US11079737Application Date: 2005-03-14
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Publication No.: US07741715B2Publication Date: 2010-06-22
- Inventor: Sun-Oo Kim , O Seo Park
- Applicant: Sun-Oo Kim , O Seo Park
- Applicant Address: DE Munich
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L23/52
- IPC: H01L23/52

Abstract:
A design for a crack stop and moisture barrier for a semiconductor device includes a plurality of discrete conductive features formed at the edge of an integrated circuit proximate a scribe line. The discrete conductive features may comprise a plurality of staggered lines, a plurality of horseshoe-shaped lines, or a combination of both.
Public/Granted literature
- US20060220250A1 Crack stop and moisture barrier Public/Granted day:2006-10-05
Information query
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