Invention Grant
- Patent Title: Through-wafer vias
- Patent Title (中): 通晶圆通孔
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Application No.: US11690181Application Date: 2007-03-23
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Publication No.: US07741722B2Publication Date: 2010-06-22
- Inventor: Paul Stephen Andry , Edmund Juris Sprogis , Kenneth Jay Stein , Timothy Dooling Sullivan , Cornelia Kang-I Tsang , Ping-Chuan Wang , Bucknell C. Webb
- Applicant: Paul Stephen Andry , Edmund Juris Sprogis , Kenneth Jay Stein , Timothy Dooling Sullivan , Cornelia Kang-I Tsang , Ping-Chuan Wang , Bucknell C. Webb
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Richard M. Kotulak
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A through-wafer via structure and method for forming the same. The through-wafer via structure includes a wafer having an opening and a top wafer surface. The top wafer surface defines a first reference direction perpendicular to the top wafer surface. The through-wafer via structure further includes a through-wafer via in the opening. The through-wafer via has a shape of a rectangular plate. A height of the through-wafer via in the first reference direction essentially equals a thickness of the wafer in the first reference direction. A length of the through-wafer via in a second reference direction is at least ten times greater than a width of the through-wafer via in a third reference direction. The first, second, and third reference directions are perpendicular to each other.
Public/Granted literature
- US20080274583A1 THROUGH-WAFER VIAS Public/Granted day:2008-11-06
Information query
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