Invention Grant
US07748138B2 Particle removal method for a substrate transfer mechanism and apparatus 有权
用于基板转印机构和装置的颗粒去除方法

Particle removal method for a substrate transfer mechanism and apparatus
Abstract:
A substrate transfer mechanism for transferring a substrate includes a mounting table on which the substrate is mounted; an arm member connected to the mounting table and moving it. The substrate transfer mechanism further includes a temperature control unit for controlling temperature of the mounting table, wherein the temperature control unit forms a temperature gradient in the mounting table. The temperature control unit includes a detector for detecting temperature in an environment or a chamber in which the substrate transfer mechanism is installed a heater for heating the mounting table and a controller for controlling an operation of the heater based on the temperature in the environment or the chamber detected by the detector.
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