Invention Grant
US07748138B2 Particle removal method for a substrate transfer mechanism and apparatus
有权
用于基板转印机构和装置的颗粒去除方法
- Patent Title: Particle removal method for a substrate transfer mechanism and apparatus
- Patent Title (中): 用于基板转印机构和装置的颗粒去除方法
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Application No.: US11128256Application Date: 2005-05-13
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Publication No.: US07748138B2Publication Date: 2010-07-06
- Inventor: Tsuyoshi Moriya , Hiroyuki Nakayama , Kikuo Okuyama , Manabu Shimada
- Applicant: Tsuyoshi Moriya , Hiroyuki Nakayama , Kikuo Okuyama , Manabu Shimada
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-144013 20040513; JP2004-316921 20041029
- Main IPC: F26B3/00
- IPC: F26B3/00 ; B65H1/00 ; C23F1/00 ; C23C16/00

Abstract:
A substrate transfer mechanism for transferring a substrate includes a mounting table on which the substrate is mounted; an arm member connected to the mounting table and moving it. The substrate transfer mechanism further includes a temperature control unit for controlling temperature of the mounting table, wherein the temperature control unit forms a temperature gradient in the mounting table. The temperature control unit includes a detector for detecting temperature in an environment or a chamber in which the substrate transfer mechanism is installed a heater for heating the mounting table and a controller for controlling an operation of the heater based on the temperature in the environment or the chamber detected by the detector.
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