Invention Grant
US07750374B2 Process for forming an electronic device including a transistor having a metal gate electrode
失效
用于形成包括具有金属栅电极的晶体管的电子器件的工艺
- Patent Title: Process for forming an electronic device including a transistor having a metal gate electrode
- Patent Title (中): 用于形成包括具有金属栅电极的晶体管的电子器件的工艺
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Application No.: US11559633Application Date: 2006-11-14
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Publication No.: US07750374B2Publication Date: 2010-07-06
- Inventor: Cristiano Capasso , Srikanth B. Samavedam , Eric J. Verret
- Applicant: Cristiano Capasso , Srikanth B. Samavedam , Eric J. Verret
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc
- Current Assignee: Freescale Semiconductor, Inc
- Current Assignee Address: US TX Austin
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
An electronic device includes an n-channel transistor and a p-channel transistor. The p-channel transistor has a first gate electrode with a first work function and a first channel region including a semiconductor layer immediately adjacent to a semiconductor substrate. In one embodiment, the first work function is less than the valence band of the semiconductor layer. In another embodiment, the n-channel transistor has a second gate electrode with a second work function different from the first work function and closer to a conduction band than a valence band of a second channel region. A process of forming the electronic device includes forming first and second gate electrodes having first and second work functions, respectively. First and second channel regions having a same minority carrier type are associated with the first and second gate electrodes, respectively.
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