Invention Grant
- Patent Title: Semiconductor device and method for manufacturing same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US10561089Application Date: 2004-06-16
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Publication No.: US07750413B2Publication Date: 2010-07-06
- Inventor: Yoshihiro Hayashi , Naoya Inoue , Kenichiro Hijioka
- Applicant: Yoshihiro Hayashi , Naoya Inoue , Kenichiro Hijioka
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Micheal Best & Friedrich LLP
- Priority: JP2003-170267 20030616
- International Application: PCT/JP2004/008450 WO 20040616
- International Announcement: WO2004/112138 WO 20041223
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
An object of the present invention is to mount both a RF circuit including an inductor formed therein and a digital circuit on a single chip.MOSFETs are formed on a semiconductor substrate 1 in regions isolated by an element isolation film 2. A plurality of low-permittivity insulator rods including a low-permittivity insulator embedded therein and penetrating a first interlevel dielectric film 4 to reach the internal of the silicon substrate are disposed in the RF circuit area 100. An inductor 40 is formed on the interlevel dielectric film in the RF circuit area by using multi-layered interconnects. A high-permeability isolation region in which a composite material including a mixture of high-permeability material and a low-permittivity material is formed in the region of the core of the inductor and periphery thereof.
Public/Granted literature
- US20060157798A1 Semiconductor device and method for manufacturing same Public/Granted day:2006-07-20
Information query
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